SAN JOSE --  A group of Silicon Valley semiconductor veterans today announced a new direct-write digital imaging technology for printed circuit board production.

After five years in development, MLI-2027 direct-write lithography system is said to feature high throughput, yield and accuracy using standard resists. It carries a patent for its imaging technology.

The technology has been beta-tested and qualified by Sanmina-SCI at its San Jose plant.

In a press release, Maskless Lithography founder and CTO Dr. Dan Meisburger said, "In 2005, based upon our founding partners' experience in both lithography and metrology, we identified an opportunity to develop a lithography system that could deliver unrivalled value to the PCB market. We believe we have exceeded that initial vision and are now ready to share this tried and tested capability."

MLI-2027 contains patented Gray Level Imaging (GLI) technology, for high printing speed using conventional dry-film resists with real-time distortion correction.

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