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Atotech Wins Patent Infringement Case in China

Published: 20 July 2015
 by Chelsey Drysdale

BERLIN – Atotech won a patent infringement case against a competitor in China relating to its Stannatech immersion tin process.

The Chinese Patent Office, in a ruling announced by the company today, declared the competitor’s patent appeal invalid and unenforceable.

The undisclosed competitor had filed the case in China despite having lost the same case in Taiwan in October 2013. In that case, the Taiwan Intellectual Property
Court had rejected all claims against Atotech.

Atotech’s Stannatech technology is an immersion tin process used as surface finish in printed circuit board and IC substrate applications.


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