PE-100 Convertible incorporates two individual plasma etching/cleaning type/mode technologies into one standalone plasma etching/cleaning system. Can switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications. Is used for R&D, medical devices, solar cells, nanotechnology, optics, printed circuit boards, MEMs, wafer level packaging, laboratory applications, and other related semiconductor processes.

Plasma Etch, www.plasmaetch.com

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