SANTA CLARA, CA - Cadence Design Systems and Mentor Graphics announced that the Open Verification Methodology (OVM) developed jointly by the two companies, was awarded the Best Design Verification Tool DesignVision award by the IEC. The OVM was also recently awarded a "2007 Best" award from Electronic Design Magazine.

"The DesignVision award recognizes the innovation and industry impact of the Open Verification Methodology," said Michal Siwinski, Cadence Marketing Director. "The OVM is already seeing great interest and praise, and we expect its success to continue to grow during the remainder of 2008."

"As the first open, language-interoperable, SystemVerilog verification methodology in the industry, the OVM represents a major step forward in protecting our customers' investment in verification," said Robert Hum, VP and GM of Mentor Graphics. "We are pleased that the OVM has been honored with this award."

The OVM methodology and accompanying library allows creation of reusable verification environments in which components communicate via transaction-level modeling interfaces. It also enables reuse through a common methodology, classes for virtual sequences and block-to-system reuse, and full integration with other languages commonly used in production flows. Distributed under the Apache 2.0 license, the OVM source code, documentation, and use examples may be downloaded free of charge from http://www.ovmworld.org.

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