Ledia 6H direct imaging system offers flexible control enabled by three wavelength light sources for broader coverage of the wavelength regions for exposure, significantly expanding the number of supported resist types.

The format improves productivity by up to 100% compared to two wavelength models. Comes with proprietary alignment algorithm that compensates for substrate distortion, for high-definition finish and throughput. New head unit has more powerful UV-LED light sources that increase productivity up to 25% over previous model. Improves energy efficiency and durability. Scans multiple alignment marks without pausing the stage, for high-throughput even if the number of alignment marks is increased.



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