Plasma Etch Inc. introduces the PE-50 benchtop plasma cleaning system, designed specifically for universities and R&D facilities.

The PE-50 uses a substantial aluminum vacuum chamber, allowing it to accommodate substrates up to 5 in. by 5 in. with 3-inch clearance. The system includes a 125 W 50 KHz RF power supply that has continuously variable power capacity.

Features include a 2-process gas roto-meters for independent gas control or gas mixing and a 7 CFM vacuum pump charged with Fomblin oil for oxygen compatibility. An optional 13.56 MHz RF power supply with automatic tuning is available.

www.plasmaetch.com