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AT&S Selects Photec Dry-Film Photoresist

Written by Administrator
Thursday, 18 October 2007
LANGENFELD, GERMANY – AT&S Austria Technologie and Systemtechnik AG have selected Hitachi’s Photec H-9825 dry-film photoresist. The dry film is currently in volume production at AT&S’s Hinterberg, Austria, facility with implementation scheduled for completion throughout Asia-Pacific manufacturing facilities during the next year. In addition, AT&S is currently evaluating Photec DL-1000, a new series of laser imaging dry-film. Photec is distributed by Enthone.

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